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NANOStation 300
The NANOStation ® 300 provides
a travel range of 550 mm x 300 mm with fast point-to-point
movements. The air-bearing stage slides on a granite reference
lpane for positioning, and can be lowered to contact during
the AFM/SPM measurement. A resolution level of less than
0,05 nm is achieved.
Specifications of the NANOStation® 300
Lowest noise floor down to the sub-nanometer level
Single plane design with air-bearing for high velocity movements
High position accuracy and repeatability
Modular design for the integration of AFM/SPM instrumentation
with additional inspection techniques, e.g. optical microscopy,
phase-shift interferometry, etc.
Easily accessible for various types of wafer robots and
mask handling systems
Designed for optimal air flow and heat removal, low thermal
drift
Principle: single plane, dual axis air-bearing stage
| Motor: |
electromagnetic,
contactless linear motor |
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Stage repeatability: |
± 250 nm |
| Optical encoder: |
accuracy class 1 µm (Heidenhain LIP581) |
Vertical stability: |
< 0,05 nm |
| Travel range, x-y: |
550 mm x 300 mm |
Maximum velocity: |
500 mm/s |
| Stage resolution : |
10 nm |
Dimensions (LxWxH): |
1620 mm x 990 mm x 530 mm |
| Absolute accuracy: |
± 1 µm |
Weight : |
ca. 1.400 kg |
Applications:
300 mm wafer inspection
Un-patterned wafer inspection
Patterned wafer inspection
Reticle inspection
Critical dimension (CD) metrology
Overlay metrology
Filter/TFT inspection
Contact
us for more information.
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